Premium
Ultrahigh‐Density Carbon Nanoring Arrays on Silicon Wafer through Templated Solution Deposition Method
Author(s) -
Liu Xikui,
Stamm Manfred
Publication year - 2009
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200900111
Subject(s) - nanoring , materials science , dewetting , wafer , silicon , nanodot , nanotechnology , nanoporous , calcination , chemical vapor deposition , carbon fibers , isotropic etching , etching (microfabrication) , optoelectronics , thin film , composite material , layer (electronics) , chemistry , biochemistry , composite number , catalysis
Ultrahigh‐density carbon nanoring arrays on a silicon wafer are achieved by a novel templated solution deposition method. Initially the silica nanodot arrays obtained from a nanoporous thin film are used as a template to direct the surface dewetting of a phenolic precursor, while further curing and calcination of the phenolic precursor, followed by etching of the silica arrays, results in large area carbon nanoring arrays with a diameter as small as 25 nm. This study provides a simple and robust chemical route to fabricate complex nanoring arrays with ultrahigh density of about one terabit per square inch.