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Novel Top‐Surface Imaging Process by Selective Chemisorption of Poly(dimethyl siloxane) on Diazoketo‐Functionalized Single Component Photoresist
Author(s) -
Ganesan Ramakrishnan,
Youn SeulKi,
Kim JinBaek
Publication year - 2008
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200700694
Subject(s) - photoresist , siloxane , materials science , polymer , chemisorption , surface modification , chemical engineering , polymer chemistry , nanotechnology , photochemistry , organic chemistry , chemistry , layer (electronics) , composite material , catalysis , engineering
A novel top‐surface imaging process was successfully established using selective chemisorption of amine‐functionalized poly(dimethyl siloxane) onto the carboxylic groups formed on the surface of diazoketo‐functionalized polymer film by UV light irradiation. The chemisorbed poly(dimethyl siloxane) worked as an efficient etch mask for the subsequent oxygen plasma etching process for pattern generation. High‐resolution patterns were resolved with the new imaging process.