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Initiated Chemical Vapor Deposition of Poly(furfuryl methacrylate)
Author(s) -
Chen Guohua,
Gupta Malancha,
Chan Kelvin,
Gleason Karen K.
Publication year - 2007
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200700466
Subject(s) - furan , chemical vapor deposition , monomer , polymerization , methacrylate , materials science , polymer chemistry , methyl methacrylate , solvent , chemical engineering , furfuryl alcohol , chemistry , organic chemistry , polymer , nanotechnology , composite material , catalysis , engineering
Furan ring‐functionalized solid surfaces are achieved by the initiated chemical vapor deposition (iCVD) method, a solvent‐free process to form films under mild conditions. The polymerization of furfuryl methacrylate monomer is initiated by a resistively heated filament wire. The functionality of the furan group in the iCVD film enabled Diels–Alder chemistry with 4‐phenyl‐1,2,3‐triazolin‐3,5‐dione (N‐PTD).