Premium
Simple Patterning of Cells on a Biocompatible Nonchemically Amplified Resist
Author(s) -
Kim JinBaek,
Ganesan Ramakrishnan,
Yoo So Young,
Choi JaeHak,
Lee Sang Yup
Publication year - 2006
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200600364
Subject(s) - resist , photoresist , lithography , materials science , biocompatible material , schematic , nanotechnology , photolithography , optoelectronics , biomedical engineering , medicine , layer (electronics) , engineering , electronic engineering
Summary: A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photoresist material was successfully used for cell patterning. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film where carboxylic groups were present.Schematic representation of the simplified lithographic process used for cell patterning.