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Patterning Layered Polymeric Multilayer Films by Room‐Temperature Nanoimprint Lithography
Author(s) -
Lu Yingxi,
Hu Wei,
Ma Ying,
Zhang Lianbin,
Sun Junqi,
Lu Nan,
Shen Jiacong
Publication year - 2006
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200500834
Subject(s) - materials science , nanoimprint lithography , acrylic acid , polyelectrolyte , chemical engineering , wafer , allylamine , silicon , polymer chemistry , polymer , nanotechnology , composite material , optoelectronics , copolymer , medicine , alternative medicine , pathology , fabrication , engineering
Summary: Polyelectrolyte multilayer films of poly(acrylic acid) (PAA)/poly(allylamine hydrochloride) (PAH) and PAH/poly(sodium 4‐styrenesulfonate) (PSS) based on electrostatic interactions as a driving force are patterned by room‐temperature nanoimprint lithography (RT‐NIL). Under an imprinting pressure of 40 bar for 8 min, well‐defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen‐bonding‐directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/poly(methyl acrylic acid) (PMAA) and poly(4‐vinylpyridine)/PAA can also be patterned in a similar way by RT‐NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.SEM image of an imprinted (PAH/PAA)*20 film on silicon wafer.
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