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Wettability of Polyhedral Oligomeric Silsesquioxane Nanostructured Polymer Surfaces
Author(s) -
Turri Stefano,
Levi Marinella
Publication year - 2005
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200500274
Subject(s) - silsesquioxane , materials science , contact angle , surface roughness , wetting , polymer , surface finish , nanocrystalline material , hysteresis , copolymer , atomic force microscopy , composite material , chemical engineering , polymer chemistry , nanotechnology , physics , quantum mechanics , engineering
Abstract Summary: Some model structures of waterborne polyurethane anionomers containing various amounts (ca. 3–20%) of a diol functionalized polyhedral oligomeric silsesquioxane (POSS) nanofiller were prepared. X‐ray diffraction showed the formation of a nanocrystalline structure in all copolymers considered. Static contact angle measurements indicated a significant enhancement of surface hydrophobicity as well as reduction in surface tension components even at the least POSS level (3%). Dynamic contact angle cycles allowed the evaluation of the hysteresis, which was found to be large and kinetically increasing in POSS‐modified samples. Film topography was analyzed by AFM, showing a more pronounced roughness in the nanostructured surface.The AFM image showing a moderate roughness increase.