Wettability of Polyhedral Oligomeric Silsesquioxane Nanostructured Polymer Surfaces | Zendy

Turri Stefano | Zendy; Levi Marinella | Zendy

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Wettability of Polyhedral Oligomeric Silsesquioxane Nanostructured Polymer Surfaces

Author(s) -

Turri Stefano,

Levi Marinella

Publication year - 2005

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.200500274

Subject(s) - silsesquioxane , materials science , contact angle , surface roughness , wetting , polymer , surface finish , nanocrystalline material , hysteresis , copolymer , atomic force microscopy , composite material , chemical engineering , polymer chemistry , nanotechnology , physics , quantum mechanics , engineering

Summary: Some model structures of waterborne polyurethane anionomers containing various amounts (ca. 3–20%) of a diol functionalized polyhedral oligomeric silsesquioxane (POSS) nanofiller were prepared. X‐ray diffraction showed the formation of a nanocrystalline structure in all copolymers considered. Static contact angle measurements indicated a significant enhancement of surface hydrophobicity as well as reduction in surface tension components even at the least POSS level (3%). Dynamic contact angle cycles allowed the evaluation of the hysteresis, which was found to be large and kinetically increasing in POSS‐modified samples. Film topography was analyzed by AFM, showing a more pronounced roughness in the nanostructured surface.The AFM image showing a moderate roughness increase.

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