Premium
Electron‐Beam Irradiation in TEM of Hard‐Segment Homopolymers and Polyurethanes with Different Hard‐Segment Content
Author(s) -
Janik Helena
Publication year - 2004
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200400061
Subject(s) - transmission electron microscopy , electron diffraction , diffraction , materials science , cathode ray , irradiation , electron beam processing , electron microscope , electron , selected area diffraction , crystallography , beam (structure) , optics , nanotechnology , chemistry , physics , quantum mechanics , nuclear physics
Summary: A hard‐segment homopolymer (HSH) and segmented poly(ester urethanes) (PESU) were studied by TEM to estimate their stability against electron‐beam irradiation. The bright‐field image and electron‐diffraction modes in TEM and optical polarised microscopy were used. It is shown that both soft and hard segments are sensitive to the electron beam. None of the films was stable enough to register an electron‐diffraction pattern without damage.Electron‐diffraction pattern taken from the film of hard‐segment homopolymer crystallised at 100 °C from DMF: (a) the pattern registered immediately; (b) the pattern registered after 5 s of exposure in the TEM at the same place.