New Positive‐Type Photoresists Based on Enzymatically Synthesized Polyphenols | Zendy

Kadota Joji | Zendy; Fukuoka Tokuma | Zendy; Uyama Hiroshi | Zendy; Hasegawa Kiichi | Zendy; Kobayashi Shiro | Zendy

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New Positive‐Type Photoresists Based on Enzymatically Synthesized Polyphenols

Author(s) -

Kadota Joji,

Fukuoka Tokuma,

Uyama Hiroshi,

Hasegawa Kiichi,

Kobayashi Shiro

Publication year - 2004

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.200300045

Subject(s) - photoresist , materials science , polyphenol , photosensitivity , epoxy , bisphenol a , monomer , polymer chemistry , composite material , chemistry , polymer , organic chemistry , optoelectronics , layer (electronics) , antioxidant

Summary: New positive‐type photoresist systems based on enzymatically synthesized polyphenols have been developed. The photoresist thin film consisting of the polyphenol and a diazonaphthoquinone derivative was prepared on copperfoil‐coated epoxy resins and exposed to UV light with different doses. The polyphenols from the bisphenol monomers exhibited high photosensitivity, comparable with a conventional cresol novolac. The sensitivity could be controlled by changing the structure of the polyphenols. Furthermore, the present photoresist showed excellent etching resistance.Characteristic exposure curves of poly( 1 )/DNQ and poly( 5 )/DNQ (both 70:30 wt.‐%) with different phenylene unit contents.

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