Poly(divinylsiloxyethylene glycol) — synthesis and photoresist characteristics | Zendy

Aoki Hidetoshi | Zendy; Tokuda Takashi | Zendy; Nagasaki Yukio | Zendy; Kato Masao | Zendy

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Poly(divinylsiloxyethylene glycol) — synthesis and photoresist characteristics

Author(s) -

Aoki Hidetoshi,

Tokuda Takashi,

Nagasaki Yukio,

Kato Masao

Publication year - 1997

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.1997.030180105

Subject(s) - photoresist , ethylene glycol , polymer , resist , polymer chemistry , materials science , condensation polymer , chemistry , nanotechnology , organic chemistry , layer (electronics) , composite material

Poly(siloxyethylene glycol) The term “poly(siloxyethylene glycol)” was used by us in our previous paper 10 for the following polymer skeleton:with pendant vinyl groups (PVSE) was synthesized by polycondensation of oligo(ethylene glycol) (MW = 300) and diaminodivinylsilane. PVSE300 thus obtained is soluble in cold water. The PVSE300 coupled with a polythiol compound shows properties of a negative working photoresist. A negative tone image was obtained by development with water at 4°C. PVSE300 is a new type of Si‐containing polymer resist which can be developed by water.

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