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Poly(divinylsiloxyethylene glycol) — synthesis and photoresist characteristics
Author(s) -
Aoki Hidetoshi,
Tokuda Takashi,
Nagasaki Yukio,
Kato Masao
Publication year - 1997
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.1997.030180105
Subject(s) - photoresist , ethylene glycol , polymer , resist , polymer chemistry , materials science , condensation polymer , chemistry , nanotechnology , organic chemistry , layer (electronics) , composite material
Poly(siloxyethylene glycol) The term “poly(siloxyethylene glycol)” was used by us in our previous paper 10 for the following polymer skeleton:with pendant vinyl groups (PVSE) was synthesized by polycondensation of oligo(ethylene glycol) (MW = 300) and diaminodivinylsilane. PVSE300 thus obtained is soluble in cold water. The PVSE300 coupled with a polythiol compound shows properties of a negative working photoresist. A negative tone image was obtained by development with water at 4°C. PVSE300 is a new type of Si‐containing polymer resist which can be developed by water.