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Modification of Polydimethylsiloxane Coatings by H 2 RF Plasma, Xe 2 * Excimer VUV Radiation, and Low‐Energy Electron Beams
Author(s) -
Swiderek Petra,
Jolondz Evgeni,
Bredehöft Jan Hendrik,
Borrmann Tobias,
Dölle Christopher,
Ott Matthias,
Schmüser Christoph,
Hartwig Andreas,
Danilov Vladimir,
Wagner HansErich,
Meichsner Jürgen
Publication year - 2012
Publication title -
macromolecular materials and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 96
eISSN - 1439-2054
pISSN - 1438-7492
DOI - 10.1002/mame.201100353
Subject(s) - materials science , excimer , plasma , polydimethylsiloxane , electron , irradiation , atomic physics , plasma processing , ion , radiation , analytical chemistry (journal) , optics , nanotechnology , fluorescence , chemistry , physics , quantum mechanics , nuclear physics , chromatography , organic chemistry
The crosslinking of thin liquid PDMS layers by three different technically relevant processes, H 2 radio‐frequency plasma treatment, Xe 2 * excimer VUV irradiation, and low‐energy electron beam processing is investigated. The modifications to the layers due to the processing are monitored by means of RAIRS. Plasma processing of liquid PDMS leads to a direct conversion to a SiO x ‐like material of the topmost layers, whereas a gradual transition from PDMS to the same product is observed upon VUV irradiation. Electron exposure does not induce oxidation. The initiating steps of the conversion induced by the interaction with VUV photons, low‐energy electrons, or their combined effect with ions and H atoms in the plasma are discussed. The latter creates a high density of damage sites.