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Force‐Free Patterning of Polyelectrolyte Multilayers under Solvent Assistance
Author(s) -
Han Lulu,
Zhou Jing,
Gong Xiao,
Yang Jie,
Gao Changyou
Publication year - 2010
Publication title -
macromolecular materials and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 96
eISSN - 1439-2054
pISSN - 1438-7492
DOI - 10.1002/mame.201000008
Subject(s) - materials science , polyelectrolyte , meniscus , solvent , nanotechnology , molding (decorative) , strips , chemical engineering , composite material , polymer , optics , organic chemistry , chemistry , physics , incidence (geometry) , engineering
Physical patterns were created on hydrated PSS/PDADMAC multilayers without using external force. A typical process was to put a PDMS stamp onto the wet and swollen multilayers, which were then put into an oven and maintained for a period of time to micromold the multilayers. The influence of molding temperature and time, multilayer thickness, solvent quality, and multilayer compositions on pattern formation were elucidated. Evolution of the patterns from double lines, double strips, and meniscus‐shaped ridges to high ridges was observed under all conditions, revealing that this is a universal principle for this process. Finally, patterns on PAA/PAH and PSS/PAH multilayers were also prepared at the optimal conditions, highlighting its wide generality on the multilayer patterning.