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Preparation of Nanowells on a PS‐ b ‐PMMA Copolymer Thin Film by CO 2 Treatment
Author(s) -
Taki Kentaro,
Waratani Yusuke,
Ohshima Masahiro
Publication year - 2008
Publication title -
macromolecular materials and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 96
eISSN - 1439-2054
pISSN - 1438-7492
DOI - 10.1002/mame.200700428
Subject(s) - materials science , copolymer , thin film , chemical engineering , polymer chemistry , polymer science , composite material , nanotechnology , polymer , engineering
Ordered nanowells with diameters of ca. 40 nm and depth of 1–2 nm were prepared on a poly(methyl methacrylate) (PMMA) spherical domain, which was exposed on the polystyrene‐ block ‐poly(methyl methacrylate) (PS‐ b ‐PMMA) copolymer thin film. The PS‐ b ‐PMMA film formed spherical PMMA domains after the film was annealed above the order–disorder transition temperature. CO 2 was dissolved into the PS‐ b ‐PMMA thin film at 8.6 MPa and at a temperature of 20 °C. The release of CO 2 ‐pressure at the same temperature created the nanowell on the PMMA domain. The temperature and pressure to create nanowells in the PMMA domain affected the possibility of nanowell's formation.

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