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Temperature‐Sensitive Hydrogel Pattern by Electron‐Beam Lithography
Author(s) -
Schmidt Thomas,
Mönch Jens Ingolf,
Arndt KarlFriedrich
Publication year - 2006
Publication title -
macromolecular materials and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 96
eISSN - 1439-2054
pISSN - 1438-7492
DOI - 10.1002/mame.200600057
Subject(s) - materials science , polymer , irradiation , wafer , electron beam lithography , electron microscope , self healing hydrogels , lithography , electron beam processing , adhesion , nanotechnology , layer (electronics) , optoelectronics , composite material , polymer chemistry , optics , resist , physics , nuclear physics
Summary: Cross‐linking of water‐soluble polymers by high‐energy irradiation provides a clean method for the synthesis of hydrogels. Some applications of stimuli‐sensitive polymers need different patterns in the micro‐ and submicrometer range on a supporting material. A dry layer of poly(vinyl methyl ether) on a Si‐wafer was cross‐linked and patterned by irradiation with the electron beam of a modified electron microscope. The patterns in the micro‐ and submicrometer range show good adhesion on the supporting material without adhesion promoter. The deformation and the elastic behavior of the pattern were tested by AFM. The formed gel structures were sensitive against changes in environmental condition. This offers a wide range of applications.AFM image of the logo “Technische Universität Dresden” generated by line‐irradiation.