Premium
Microscopic Characterization of Poly(Sulfur Nitride)
Author(s) -
Amado Elkin,
Hasan Nazmul,
Busse Karsten,
Kressler Jörg
Publication year - 2021
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.202100113
Subject(s) - materials science , thin film , crystallography , sublimation (psychology) , ohmic contact , silicon nitride , nitride , crystal (programming language) , nanotechnology , chemistry , layer (electronics) , psychology , psychotherapist , computer science , programming language
The morphology of poly(sulfur nitride) (SN x ) in bulk crystals and in thin films is investigated by grazing incidence wide‐angle X‐ray scattering (GI WAXS) and atomic force microscopy (AFM). SN x crystals are grown in S 2 N 2 crystals by topochemical solid‐state polymerization and thin SN x films are prepared by sublimation/repolymerization of SN x or by mechanical deformation of crystals onto silicon substrates. Details of the crystallographic orientation of two different thin films are observed by GI WAXS. PeakForce Tunneling (PF‐TUNA) atomic force microscopy provides information on the electrical conductivity of SN x crystal together with its morphology in the nm range. The current–voltage ( I – V ) curves show ohmic behavior indicating the metallic nature of SN x .