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Design Principle of Reactive Components for Dimethacrylate‐Terminated Quantum Dots: Preserved Photoluminescent Quantum Yield, Excellent Pattern Uniformity, and Suppression of Aggregation in the Matrix
Author(s) -
Lee Seonwoo
Publication year - 2020
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201900488
Subject(s) - quantum yield , quantum dot , photoluminescence , photoresist , yield (engineering) , copolymer , chemical engineering , materials science , chemistry , nanotechnology , polymer , optoelectronics , organic chemistry , fluorescence , composite material , optics , physics , engineering , layer (electronics)
With the advent of various quantum dot (QD)‐based application technologies, the demand for low‐cost, eco‐friendly, high‐performance nanocomposites (e.g., QD photoresist) is rapidly increasing. However, the aggregation phenomenon due to incompatibility between QDs and components is still a limitation in industrial use. Herein, the principle of selecting reactive components that inhibit aggregation and preserve photoluminescent properties is presented. For model QDs (bis[2‐(methacryloyloxy)ethyl] phosphate/1‐dodecanethiol [BMEP/DDT] capped QDs), BMEP allows copolymerization and coadded DDT minimizes the loss of absolute quantum yield during ligand exchange. Besides, bisphenol A ethoxylate dimethacrylate ( M n : ≈1700, polyethylene oxide) suppresses aggregation in the matrix and provide high solubility in alkaline solution. More specifically, the coated thin film (1.0 µm thick) containing up to 20.0 wt% QDs exhibits not only transmittance of more than 85% at 550 nm, but also excellent pattern uniformity at high resolution.