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Sonophotolytically Synthesized Silicon Nanoparticle‐Polymer Composite Ink from a Commercially Available Lower Silane
Author(s) -
Cádiz Bedini Andrew P.,
Muthmann Stefan,
Flohre Jan,
Thiele Björn,
Willbold Sabine,
Carius Reinhard
Publication year - 2016
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201600005
Subject(s) - silane , materials science , silicon , polymer , chemical engineering , chemical vapor deposition , plasma enhanced chemical vapor deposition , silanes , nanoparticle , amorphous silicon , amorphous solid , ultraviolet light , nanotechnology , crystalline silicon , composite material , optoelectronics , chemistry , organic chemistry , engineering
The preparation of a printable silicon ink using semiconductor grade and commercially available trisilane (Si 3 H 8 ) is reported. The synthesis is carried out in solution at room temperature or below in N 2 atmosphere at ambient pressure and involves an initial sonication step, followed by irradiation with ultraviolet light. The production of higher order silanes via ultrasound is demonstrated using gas chromatography and nuclear magnetic resonance measurements are used to show that a combined sonophotolytic treatment yields a highly branched silicon hydride polymer. In addition, scanning electron microscopy (SEM) images are used to ascertain the sonocatalytic production of silicon nanoparticles. Furthermore, it is argued that these particles are partially responsible for enabling dramatically accelerated polymer growth, not otherwise observed in the same amount of time using ultraviolet light alone. Finally, the utility of the ink used in this study is demonstrated for the field of printable electronics by fabricating amorphous silicon thin films by spin‐coating and atmospheric pressure chemical vapor deposition with optoelectronic properties approaching those of state‐of‐the‐art plasma enhanced chemical vapor deposition (PECVD) material.