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Macromol. Chem. Phys. 3/2013
Author(s) -
Yagüe Jose Luis,
Coclite Anna Maria,
Petruczok Christy,
Gleason Karen K.
Publication year - 2013
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201370008
Subject(s) - chemical vapor deposition , coating , polymer , materials science , chemical engineering , yield (engineering) , nanotechnology , deposition (geology) , thin film , conformal coating , polymer chemistry , chemistry , polymer science , composite material , engineering , paleontology , sediment , biology
Front Cover: Chemical vapor deposition (CVD) is a powerful technology for engineering surfaces. Initiated chemical vapor deposition (iCVD), a new technique utilizing benign reaction conditions to yield conformal and functional polymer thin films, is discussed along with the latest achievements in coating surfaces and 3D substrates with functional materials. The technique's use in biotechnology and selective permeation applications is reviewed, and future directions are discussed. Further details can be found in the article by J. L. Yagüe, A. M. Coclite, C. Petruczok, and K. K. Gleason* on page 302 .