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Chemical Vapor Deposition for Solvent‐Free Polymerization at Surfaces
Author(s) -
Yagüe Jose Luis,
Coclite Anna Maria,
Petruczok Christy,
Gleason Karen K.
Publication year - 2013
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201200600
Subject(s) - chemical vapor deposition , polymer , polymerization , combustion chemical vapor deposition , deposition (geology) , coating , chemical engineering , materials science , yield (engineering) , nanotechnology , hybrid physical chemical vapor deposition , solvent , thin film , chemistry , polymer chemistry , organic chemistry , carbon film , composite material , paleontology , sediment , engineering , biology
Chemical vapor deposition (CVD) methods are a powerful technology for engineering surfaces. When CVD is combined with the richness of organic chemistry, the resulting polymeric coatings, deposited without solvents, represent an enabling technology in many different fields of application. This article focuses on initiated chemical vapor deposition (iCVD), a new technique that utilizes benign reaction conditions to yield conformal and functional polymer thin films. The latest achievements in coating surfaces and 3D substrates with functional materials, and the use of the technique for biotechnology and selective permeation applications are reviewed, and future directions for iCVD technology are discussed.