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Random Poly(methyl methacrylate‐ co ‐styrene) Brushes by ATRP to Create Neutral Surfaces for Block Copolymer Self‐Assembly
Author(s) -
Liu Hui,
O'Mahony Colm T.,
Audouin Fabrice,
Ventura Claudia,
Morris Michael,
Heise Andreas
Publication year - 2012
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201100531
Subject(s) - copolymer , styrene , polymer chemistry , methyl methacrylate , atom transfer radical polymerization , monomer , materials science , polymer , methacrylate , radical polymerization , composite material
Random copolymer brushes of styrene and methyl methacrylate (MMA) on silicon wafers by atom transfer radical polymerization (ATRP) are synthesized using CuCl/CuCl 2 /HMTETA. It is found that with increasing amount of styrene the thickness of the brush layer could no longer be well controlled by the amount of free (sacrificial) initiator in the reaction. At constant concentration of free initiator a constant thickness is obtained for various ratios of MMA to styrene. Within 30–70% MMA in the monomer feed the composition of the free polymer corresponds well to the monomer feed ratio, displaying a water contact angle in agreement with the theoretical value for a random copolymer. These copolymers are shown to create a neutral surface directing spin‐coated poly(styrene‐ b ‐MMA) into a perpendicular lamellae orientation.