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Thin Films of Semifluorinated Block Copolymers Prepared by ATRP
Author(s) -
Irita Tomomi,
Chen Dian,
Li Xuefa,
Wang Jin,
Russell Thomas P.
Publication year - 2011
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201100321
Subject(s) - copolymer , lamellar structure , polymer chemistry , atom transfer radical polymerization , materials science , thin film , styrene , surface energy , wafer , substrate (aquarium) , silicon , chemical engineering , polymerization , wetting , nanotechnology , composite material , polymer , optoelectronics , oceanography , geology , engineering
A symmetric diblock copolymer, poly(pentafluorostyrene‐ b ‐styrene) (PPFS‐ b ‐PS), is synthesized by atom transfer radical polymerization (ATRP). The behavior of PPFS‐ b ‐PS thin films on silicon wafers is investigated. Lamellar microdomains oriented parallel to the film surface are formed when the thin films are heated to 220 °C for 24 h, due to preferential interfacial interactions and the low surface energy of the PPFS. An electric field is used to overcome the low surface energy of the fluorinated block and preferential interactions with the substrate so as to force the lamellar microdomains to orient normal to the surface.