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Light‐Directed Anisotropic Reorientation of Mesopatterns in Block Copolymer Monolayers
Author(s) -
Aoki Kenji,
Iwata Takafumi,
Nagano Shusaku,
Seki Takahiro
Publication year - 2010
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.201000474
Subject(s) - azobenzene , photoisomerization , copolymer , irradiation , materials science , monolayer , erasure , anisotropy , photochemistry , azo compound , side chain , polymer chemistry , methacrylate , optics , chemistry , isomerization , nanotechnology , composite material , physics , polymer , organic chemistry , catalysis , computer science , programming language , nuclear physics
Photoreorientation of a stripe pattern consisting of an MPS structure in a Langmuir‐Blodgett monolayer by irradiation with linearly polarized light is achieved for the first time using a PDMS/poly(methacrylate) diblock copolymer with a liquid crystalline azobenzene‐containing side chain. The stripe MPS pattern in the trans azobenzene state is diminished by photoisomerization to the cis form upon UV light irradiation. By the erasure of the MPS structure, the anisotropic photo‐oriented stripe pattern is generated upon irradiation with linearly polarized visible light, the orientation of the stripe pattern being orthogonal to the electric vector of the light.