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Photosensitive High‐Refractive‐Index Poly(acrylic acid)‐ graft ‐Poly(ethylene glycol methacrylate) Nanocrystalline Titania Hybrid Films
Author(s) -
Su HungWen,
Chen WenChang
Publication year - 2008
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200800174
Subject(s) - materials science , ethylene glycol , methacrylate , nanocrystalline material , high resolution transmission electron microscopy , polymer chemistry , transmission electron microscopy , chemical engineering , high refractive index polymer , refractive index , anatase , hybrid material , acrylic acid , copolymer , polymer , nanotechnology , composite material , chemistry , organic chemistry , optoelectronics , photocatalysis , catalysis , engineering
In this study, photosensitive high‐refractive‐index poly(acrylic acid)‐ graft ‐poly(ethylene glycol methacrylate)‐(3‐trimethoxysilyl propyl methacrylate)‐modified titania hybrid materials were synthesized, followed by hydrothermal treatment. Nanocrystalline titania in the hybrid materials, analyzed by high‐resolution transmission electron microscopy (HRTEM), X‐ray diffraction (XRD) and small‐angle X‐ray scattering (SAXS), had domain sizes of around 3–7 nm and had a more‐compact anatase structure at a higher titania content. The prepared optically transparent films had a refractive index in the range of 1.528–1.803 as the titania content increased from 5.6 to 61.9 wt.‐%. A fine pattern with a line width of 20 µm was produced by a direct lithographic process on the hybrid films. The present study demonstrates a novel approach for preparing photosensitive high‐refractive‐index hybrid materials with patternability.

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