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Vacuum‐Ultraviolet Photopolymerisation of Amine‐Rich Thin Films
Author(s) -
TruicaMarasescu Florina,
Wertheimer Michael R.
Publication year - 2008
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200800089
Subject(s) - thin film , chemistry , polymer , x ray photoelectron spectroscopy , amine gas treating , ultraviolet , polymerization , photochemistry , polymer chemistry , glow discharge , nitrogen , plasma , analytical chemistry (journal) , chemical engineering , materials science , organic chemistry , nanotechnology , physics , optoelectronics , quantum mechanics , engineering
Nitrogen‐rich organic thin films were deposited by VUV‐assisted photochemical polymerisation of flowing C 2 H 4 /NH 3 mixtures. The fundamental reaction mechanisms of these binary gas mixtures were investigated as a function of the wavelength of two almost monochromatic VUV sources. Compositions of these “UV‐PE:N” films close to the surface were determined by XPS, and the amine concentrations and selectivities were quantified via chemical derivatisation. The UV‐PE:N films were compared with plasma polymers deposited using low‐pressure glow discharges in similar gas flow mixtures, “L‐PPE:N”; it is shown that VUV photochemistry is superior to plasma chemistry in producing almost monofunctional organic thin films.