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Two Coexisting Modes in Field‐Assisted AFM Nanopatterning of Thin Polymer Films
Author(s) -
Xie Xian Ning,
Chung Hong Jing,
Bandyopadhyay Dipankar,
Sharma Ashutosh,
Sow Chorng Haur,
Bettiol Andrew Anthony,
Wee Andrew Thye Shen
Publication year - 2008
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200800074
Subject(s) - electrohydrodynamics , polymer , materials science , instability , nanotechnology , chemical physics , atomic force microscopy , electric field , nanolithography , composite material , chemistry , mechanics , fabrication , medicine , physics , alternative medicine , quantum mechanics , pathology
Two coexisting mechanisms, i.e., electrohydrodynamic destabilization and electrostatic detachment, for polymer nanostructuring in field‐assisted atomic force microscope nanolithography are presented. The electrohydrodynamic destabilization mechanism is based on the surface instability of molten polymer film in the form of surface waves, and it leads to the formation of well defined polymeric wave patterns. The electrostatic detachment mechanism is associated with nano‐blister formation caused by pre‐existing defects, such as buried cavities in the polymer, and is responsible for the creation of hollow pillar‐like structures. Here, the coexistence and pattern formation probability of the two polymer patterning modes under similar nanolithographic conditions are discussed. It was found that the field strength and the efficiency of probe‐induced joule heating can significantly change the flow property of the polymer, which eventually leads to the occurrence of the two modes. The results presented here are useful in obtaining a complete picture of the diverse behaviors of polymers in AFM nanolithographic operations.