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Contrast Inversion in TEM Studies of Poly(ferrocenylsilane)‐ block ‐Poly(dimethylsiloxane) Diblock Copolymers
Author(s) -
Wang Yishan,
Coombs Neil,
Manners Ian,
Winnik Mitchell A.
Publication year - 2008
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200800048
Subject(s) - copolymer , lamellar structure , polymer , materials science , high contrast , polymer chemistry , inversion (geology) , cathode ray , electron , optics , composite material , geology , physics , paleontology , structural basin , quantum mechanics
This paper describes an unusual contrast inversion phenomenon in TEM imaging of PFS‐ b ‐PDMS block copolymer bulk samples. It is clearly observed especially in samples that show a lamellar morphology that the contrast inversion is accompanied by a contraction of the PDMS domains and an expansion of the Fe‐rich domains. The location of the iron‐ and silicon‐rich domains was monitored by EDX analysis. We infer that the contrast inversion was caused by electron beam radiation‐induced damage to, and possible cross‐linking of, PDMS chains. A simple way to selectively deposit metal on electron beam patterned polymer film was demonstrated.