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UV Laser Deposition of SiS/Poly(thiacarbosilane) Composites and their Conversion to SiO/Poly(thiacarbosiloxane) Composites
Author(s) -
Tomovska Radmila,
Urbanová Markéta,
Šubrt Jan,
Boháček Jaroslav,
Pola Josef
Publication year - 2007
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200700128
Subject(s) - composite material , silane , materials science , composite number , sulfide , polymer , chemical vapor deposition , scanning electron microscope , deposition (geology) , nanotechnology , metallurgy , paleontology , sediment , biology
ArF laser irradiation of gaseous mixtures of carbon disulfide and silane allows efficient deposition of SiS bond‐containing poly(thiacarbosilanes) incorporating SiS bodies. These SiS/poly(thiacarbosilane) composites are the first example of silicon sulfide/polymer composites. Composite formation is analyzed by GC/MS analysis of volatile products and the structure of the composite as determined by electron microscopy and FT‐IR spectra. The composites undergo reaction with air moisture and methanol vapor, evolve H 2 S and evolve to nano‐sized poly(thiacarbosiloxane)s and poly(methoxythiacarbosiloxane)s.