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Novel Polymers to Study the Influence of the Azobenzene Content on the Photo‐Induced Surface Relief Grating Formation
Author(s) -
Börger Volker,
Kuliskovska Olga,
G.Hubmann Kati,
Stumpe Joachim,
Huber Marco,
Menzel Henning
Publication year - 2005
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200500147
Subject(s) - azobenzene , polymer , stacking , grating , alkoxy group , chemistry , materials science , polymer chemistry , azo compound , photochemistry , organic chemistry , optoelectronics , alkyl
Summary: The influence of the azobenzene concentration on the photo‐induced surface relief grating (SRG) formation in polymer films was investigated. Two series of polymers with 4‐alkoxy‐4′‐cyanoazobenzene side groups were synthesized. In series A, the degree of substitution was varied, while in series B, azobenzene and biphenyl groups were introduced in varying composition, but the concentration of non‐reacted HEMA‐groups was kept constant. Photo‐induction of the dichroism and the SRG was studied as function of the azobenzene concentration. An optimum was found for the SRG formation (76%), while the highest dichroism was induced at the lowest azobenzene concentration of 20%. The restriction of rotational and translational molecular motions observed at higher azobenzene concentration was explained by π ‐ π stacking of the azobenzene moieties and interaction of unreacted HEMA groups.AFM topography image of surface relief grating in polymer B‐76.