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Controlled Radical Polymerization of Vaporized Vinyl Monomers on Solid Surfaces under UV Irradiation
Author(s) -
Yasutake Mikio,
Andou Yoshito,
Hiki Shigehiro,
Nishida Haruo,
Endo Takeshi
Publication year - 2004
Publication title -
macromolecular chemistry and physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.57
H-Index - 112
eISSN - 1521-3935
pISSN - 1022-1352
DOI - 10.1002/macp.200300089
Subject(s) - copolymer , monomer , polymer chemistry , polymerization , methyl methacrylate , polymer , irradiation , styrene , materials science , solvent , vinyl acetate , radical polymerization , chemistry , photochemistry , organic chemistry , composite material , physics , nuclear physics
Summary: In order to prepare well‐defined polymers on solid surfaces in the gas phase, a gas phase‐assisted surface polymerization (GASP) of vinyl monomers was carried out on solid surfaces pre‐coated with a photoiniferter, 2‐cyanoprop‐2‐yl N,N ′‐dimethyldithiocarbamate, under UV irradiation. The GASP of methyl methacrylate (MMA) resulted in the formation of polymer on the surfaces and showed a proportional relationship between $\overline M _{\rm n}$ and polymer yield. Consecutive copolymerization of MMA and styrene led to the formation of a block copolymer, which was confirmed by a selective solvent fractionation method. These results demonstrate that controlled radical polymerization of vaporized monomer occurred on the solid surfaces.Expected mechanism of GASP under UV irradiation.