Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties | Zendy

Lee Bong Kuk | Zendy; Kawai Tomoji | Zendy; Chung Bong Hyun | Zendy

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Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties

Author(s) -

Lee Bong Kuk,

Kawai Tomoji,

Chung Bong Hyun

Publication year - 2011

Publication title -

macromolecular bioscience

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.924

H-Index - 105

eISSN - 1616-5195

pISSN - 1616-5187

DOI - 10.1002/mabi.201000362

Subject(s) - silsesquioxane , peg ratio , materials science , optical transparency , thermal stability , ethylene glycol , dewetting , aqueous solution , chemical engineering , chemical resistance , polymer chemistry , nanotechnology , chemistry , polymer , organic chemistry , composite material , thin film , optoelectronics , finance , engineering , economics

A free‐radical‐polymerizable SSQ/PEG blend with direct patternability has been proposed as an ideal nonfouling material for nanostructure‐based biomedical applications. Cured SSQ/PEG networks show an UV transparency of >90% at 365 nm, high resistance to organic/aqueous solutions, hydrophilicity and Young's moduli of 1.898–2.815 GPa. SSQ/PEG patterns with 25‐nm linewidths, 25‐nm spacing, and an aspect ratio of 4:1 were directly fabricated on transparent substrates by UV embossing, and cured SSQ/PEG networks with long‐term stability under chemical, thermal, and biological stress showed strong resistance to the nonspecific adsorption of biomolecules. These characteristics may offer a new strategy for the development of a number of medical nanodevice applications such as labs‐on‐a‐chip.

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