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Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties
Author(s) -
Lee Bong Kuk,
Kawai Tomoji,
Chung Bong Hyun
Publication year - 2011
Publication title -
macromolecular bioscience
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.924
H-Index - 105
eISSN - 1616-5195
pISSN - 1616-5187
DOI - 10.1002/mabi.201000362
Subject(s) - silsesquioxane , peg ratio , materials science , optical transparency , thermal stability , ethylene glycol , dewetting , aqueous solution , chemical engineering , chemical resistance , polymer chemistry , nanotechnology , chemistry , polymer , organic chemistry , composite material , thin film , optoelectronics , finance , engineering , economics
A free‐radical‐polymerizable SSQ/PEG blend with direct patternability has been proposed as an ideal nonfouling material for nanostructure‐based biomedical applications. Cured SSQ/PEG networks show an UV transparency of >90% at 365 nm, high resistance to organic/aqueous solutions, hydrophilicity and Young's moduli of 1.898–2.815 GPa. SSQ/PEG patterns with 25‐nm linewidths, 25‐nm spacing, and an aspect ratio of 4:1 were directly fabricated on transparent substrates by UV embossing, and cured SSQ/PEG networks with long‐term stability under chemical, thermal, and biological stress showed strong resistance to the nonspecific adsorption of biomolecules. These characteristics may offer a new strategy for the development of a number of medical nanodevice applications such as labs‐on‐a‐chip.