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On‐Chip Integrated Waveguide Amplifiers on Erbium‐Doped Thin‐Film Lithium Niobate on Insulator
Author(s) -
Zhou Junxia,
Liang Youting,
Liu Zhaoxiang,
Chu Wei,
Zhang Haisu,
Yin Difeng,
Fang Zhiwei,
Wu Rongbo,
Zhang Jianhao,
Chen Wei,
Wang Zhe,
Zhou Yuan,
Wang Min,
Cheng Ya
Publication year - 2021
Publication title -
laser and photonics reviews
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.778
H-Index - 116
eISSN - 1863-8899
pISSN - 1863-8880
DOI - 10.1002/lpor.202100030
Subject(s) - lithium niobate , materials science , erbium , photolithography , optoelectronics , waveguide , optical amplifier , amplifier , optics , thin film , photonics , doping , wavelength , insulator (electricity) , net gain , laser , nanotechnology , cmos , physics
On‐chip light amplification with integrated optical waveguide fabricated on erbium‐doped thin‐film lithium niobate on insulator (TFLNOI) is demonstrated using the photolithography‐assisted chemomechanical etching (PLACE) technique. A maximum internal net gain of 18 dB in the small‐signal‐gain regime is measured at the peak emission wavelength of 1530 nm for a waveguide length of 3.6 cm, indicating a differential gain per unit length of 5 dB cm −1 . This work paves the way to the monolithic integration of diverse active and passive photonic components on the TFLNOI platform.