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Control of surface charge for high‐fidelity nanostructuring of materials
Author(s) -
Gervinskas Gediminas,
Seniutinas Gediminas,
Juodkazis Saulius
Publication year - 2013
Publication title -
laser and photonics reviews
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.778
H-Index - 116
eISSN - 1863-8899
pISSN - 1863-8880
DOI - 10.1002/lpor.201300093
Subject(s) - materials science , ion , optoelectronics , electron , dielectric , ionization , focused ion beam , secondary electrons , light emitting diode , nanolithography , diode , optics , fabrication , chemistry , physics , medicine , alternative medicine , organic chemistry , pathology , quantum mechanics
The universal problem of surface charging during focused ion milling has been fully resolved using a flood‐gun approach based on simultaneous co‐illumination with a UV light‐emitting diode (LED). Non‐distorted as‐designed nano‐patterns were milled using Ga + ions on dielectric materials which charge up strongly. Deep‐UV (250–280 nm) LED co‐illumination during the ion beam milling fully discharges optically the surface under standard Ga + ion‐milling conditions. Photo‐ionization of electrons trapped at the sub‐surface defects to the free vacuum state is a key to the phenomenon ( λ = 250 nm corresponds to a photon energy h ν = 4.96 eV). The method is applicable as a solution to other charging problems where electrons (primary or secondary) and their spatial redistribution affect nanofabrication or imaging.