Vacuum ultraviolet photolysis of CClF 2 CH 2 Cl | Zendy

Minamikawa Tadahiro | Zendy; Ogura Seido | Zendy; Sakka Tetsuo | Zendy; Ogata Yukio | Zendy; Iwasaki Matae | Zendy

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Vacuum ultraviolet photolysis of CClF 2 CH 2 Cl

Author(s) -

Minamikawa Tadahiro,

Ogura Seido,

Sakka Tetsuo,

Ogata Yukio,

Iwasaki Matae

Publication year - 1994

Publication title -

international journal of chemical kinetics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.341

H-Index - 68

eISSN - 1097-4601

pISSN - 0538-8066

DOI - 10.1002/kin.550260509

Subject(s) - chemistry , photodissociation , vacuum ultraviolet , yield (engineering) , chlorine , ultraviolet , chlorine atom , photochemistry , irradiation , high pressure , organic chemistry , medicinal chemistry , physics , materials science , quantum mechanics , optics , metallurgy , engineering physics , nuclear physics , engineering

Photolysis of CClF 2 CH 2 Cl was studied by 147 nm vacuum ultraviolet irradiation. In the presence of NO; CF 2 CH 2 , CF 2 CHCl, and CClF 2 CN were produced. These products represent three different reaction paths; the molecular dechlorination, molecular dehydrochlorination, and chlorine radical elimination reactions. The reactant pressure and the addition gas (He or NO) pressure effects upon the product yield were studied. © 1994 John Wiley & Sons, Inc.

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