Premium
Vacuum ultraviolet photolysis of CClF 2 CH 2 Cl
Author(s) -
Minamikawa Tadahiro,
Ogura Seido,
Sakka Tetsuo,
Ogata Yukio,
Iwasaki Matae
Publication year - 1994
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550260509
Subject(s) - chemistry , photodissociation , vacuum ultraviolet , yield (engineering) , chlorine , ultraviolet , chlorine atom , photochemistry , irradiation , high pressure , organic chemistry , medicinal chemistry , physics , materials science , quantum mechanics , optics , metallurgy , engineering physics , nuclear physics , engineering
Photolysis of CClF 2 CH 2 Cl was studied by 147 nm vacuum ultraviolet irradiation. In the presence of NO; CF 2 CH 2 , CF 2 CHCl, and CClF 2 CN were produced. These products represent three different reaction paths; the molecular dechlorination, molecular dehydrochlorination, and chlorine radical elimination reactions. The reactant pressure and the addition gas (He or NO) pressure effects upon the product yield were studied. © 1994 John Wiley & Sons, Inc.