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On the mechanism of C 2 F 5 I photolysis in the presence of trifluoroacetic acid
Author(s) -
Lane S. I.,
Oexler E. V.,
Staricco E. H.
Publication year - 1991
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550230106
Subject(s) - chemistry , photodissociation , trifluoroacetic acid , radical , photochemistry , gas phase , reaction mechanism , mechanism (biology) , atmospheric temperature range , medicinal chemistry , organic chemistry , catalysis , philosophy , physics , epistemology , meteorology
The photolysis of C 2 F 5 I with CF 3 COOH in the temperature range 473–533 K was studied in the gas phase. Evidence is presented that supports a complex mechanism for the formation of C 2 F 5 H through the H‐atom abstraction reaction from CF 3 COOH by C 2 F 5 radicals as well as the participation of I( 2 P ½ ).