On the mechanism of C 2 F 5 I photolysis in the presence of trifluoroacetic acid | Zendy

Lane S. I. | Zendy; Oexler E. V. | Zendy; Staricco E. H. | Zendy

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On the mechanism of C 2 F 5 I photolysis in the presence of trifluoroacetic acid

Author(s) -

Lane S. I.,

Oexler E. V.,

Staricco E. H.

Publication year - 1991

Publication title -

international journal of chemical kinetics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.341

H-Index - 68

eISSN - 1097-4601

pISSN - 0538-8066

DOI - 10.1002/kin.550230106

Subject(s) - chemistry , photodissociation , trifluoroacetic acid , radical , photochemistry , gas phase , reaction mechanism , mechanism (biology) , atmospheric temperature range , medicinal chemistry , organic chemistry , catalysis , philosophy , physics , epistemology , meteorology

The photolysis of C 2 F 5 I with CF 3 COOH in the temperature range 473–533 K was studied in the gas phase. Evidence is presented that supports a complex mechanism for the formation of C 2 F 5 H through the H‐atom abstraction reaction from CF 3 COOH by C 2 F 5 radicals as well as the participation of I( 2 P ½ ).

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