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Smog chamber study of H 2 O 2 formation in etheneNO x and propeneNO x mixtures
Author(s) -
Meagher James F.,
Olszyna Kenneth J.,
Simonaitis Romualdas
Publication year - 1990
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550220708
Subject(s) - propene , chemistry , hydrogen peroxide , gas phase , radical , hydrogen , reaction mechanism , inorganic chemistry , analytical chemistry (journal) , catalysis , organic chemistry
Hydrogen peroxide formation in the photooxidation of CONO x , etheneNO x , and propeneNO x mixtures has been determined in the TVA 31 cubic meter smog chamber under the following conditions: [NO x ] ca. 22–46 ppb; ethene = 0.22–1.1 ppm, [propene] = 0.12–0.97 ppm; [H 2 O] ca. 8 × 10 −3 ppm. Ethene, propene, NO, NO x , PAN, HCHO, and CH 3 CHO were also monitored. Computer modeling was performed using the gas phase ethene and propene mechanism of the Regional Acid Deposition Model. There is good agreement between the model predicted and observed H 2 O 2 concentrations. However, to successfully model all the propeneNO x experimental results, organic nitrate formation from the reaction of peroxy radicals with NO must be included in the mechanism.