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N 2 O 5 photolysis products investigated by fluorescence and optoacoustic techniques
Author(s) -
Barker J. R.,
Brouwer L.,
Patrick R.,
Rossi M. J.,
Trevor P. L.,
Golden D. M.
Publication year - 1985
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550170906
Subject(s) - photodissociation , chemistry , quantum yield , fluorescence , radical , torr , yield (engineering) , laser , laser induced fluorescence , analytical chemistry (journal) , photochemistry , optics , chromatography , physics , materials science , organic chemistry , metallurgy , thermodynamics
Abstract Pulsed laser photolysis of N 2 O 5 near 290 nm coupled with fluorescence detection (calibrated by NO 2 photolysis) showed that the O( 3 P) quantum yield is ≤0.1. A pulsed laser optoacoustic technique in a flow tube (ca. 6 torr of N 2 ) was tested by photolysis of NO 2 and then applied to N 2 O 5 . Nitric oxide was added to react with NO 3 free radical and the resulting increase in the optoacoustic signal confirmed the presence of NO 3 free radicals. Based on the relative optoacoustic signals observed for NO 2 and N 2 O 5 , the quantum yield for NO 3 production is 0.8 ± 0.2.