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Rate of decomposition of hexafluoroazomethane and the absolute rate of recombination of trifluoromethyl radical at higher temperatures
Author(s) -
Rossi M.,
Golden D. M.
Publication year - 1979
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550110709
Subject(s) - chemistry , radical , arrhenius equation , decomposition , homogeneous , recombination , trifluoromethyl , reaction rate constant , atmospheric temperature range , thermodynamics , analytical chemistry (journal) , activation energy , kinetics , organic chemistry , alkyl , biochemistry , physics , quantum mechanics , gene
The unimolecular homogeneous decomposition of hexafluoroazomethane was studied in a VLPP apparatus in the temperature range 720–1050 K and is consistent with the following Arrhenius parameters:\documentclass{article}\pagestyle{empty}\begin{document}$$ \log k(\sec ^{ - 1}) = 16.2 - 55.2/\theta $$\end{document}at 900 K, where the A factor was assumed to be the same as for 2,2′‐azoisobutane. The homogeneous rate of recombination of ·CF 3 radicals at temperatures around 1000 K was also studied under VLPP conditions and was found to be in the fall‐off region, corresponding to k / k ∞ = 8.5 × 10 −3 when a rotational transition‐state model was used. This model predicts an essentially constant value of k r ∞ of 10 9.7 over the temperature range 300–1000 K.