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Fre‐radical addition to olefins, Part 22 . Arrhenius parameters for the addition of trifluoromethyl radicals to vinyl monomers (CH 2 CHX)
Author(s) -
Low H. C.,
Tedder J. M.,
Walton J. C.
Publication year - 1978
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.550100402
Subject(s) - chemistry , arrhenius equation , acrylonitrile , radical , vinyl bromide , trifluoromethyl , methyl vinyl ketone , vinyl chloride , activation energy , monomer , photochemistry , reaction rate constant , bromide , free radical addition , addition reaction , polymer chemistry , organic chemistry , kinetics , polymer , alkyl , catalysis , physics , quantum mechanics , copolymer
Relative Arrhenius parameters have been determined for the addition of trifluoromethyl radicals to vinyl chloride (XCl), vinyl bromide (XBr), acrylonitrile (XCN), methyl vinyl ketone (XCOCH 3 ), 2‐methylbut‐2‐ene, and to iso‐butene, taking the rate of addition to ethylene as standard. Addition occurred virtually exclusively at the unsubstituted end of all the olefins. The relative rates of addition at 164°C show very little variation. The preexponential terms for addition to the CH 2 ends are constant within experimental error, and the small variations in rate are due principally to the activation energy term. The present results are put on an absolute scale using the previously determined Arrhenius parameters for addition to ethylene and are compared with data for other similar monomers determined previously.