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Quantum yield for hydrogen atom formation from H 2 O 2 photolysis in the range 193–240 nm
Author(s) -
Nakayama Tomoki,
Takahashi Kenshi,
Matsumi Yutaka
Publication year - 2005
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/kin.20127
Subject(s) - chemistry , photodissociation , quantum yield , yield (engineering) , hydrogen atom , fluorescence , atom (system on chip) , analytical chemistry (journal) , hydrogen , range (aeronautics) , photochemistry , optics , physics , organic chemistry , alkyl , materials science , computer science , composite material , thermodynamics , embedded system
Photodissociation processes of H 2 O 2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005
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