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Monolithic full‐color microdisplay using patterned quantum dot photoresist on dual‐wavelength LED epilayers
Author(s) -
Li Peian,
Zhang Xu,
Li Yangfeng,
Qi Longheng,
Tang Chak Wah,
Lau Kei May
Publication year - 2021
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.966
Subject(s) - rgb color model , gamut , materials science , optoelectronics , high color , photoresist , quantum dot , color gel , primary color , light emitting diode , optics , color filter array , pixel , color image , computer science , physics , thin film transistor , artificial intelligence , image processing , nanotechnology , layer (electronics) , image (mathematics)
A passive‐matrix monolithic full‐color InGaN light emitting diode (LED) microdisplay with 40 × 40 full‐color pixels is demonstrated. Each full‐color pixel consists of red, green, and blue (RGB) subpixels that have a pitch size of 40 μm × 120 μm. The full‐color microdisplay is monolithically fabricated on blue/green dual‐wavelength LED epilayers, using red quantum dot photoresist as a color converter. Pure RGB emission and a wide color gamut are achieved, as shown by electroluminescence spectra. Full‐color patterns with controllable grayscale and color mixing can be clearly rendered driven by a full‐color microdisplay controller, indicating tremendous potential of this novel approach for full‐color LED microdisplays in the future.