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Active matrix QD‐LED with top emission structure by UV lithography for RGB patterning
Author(s) -
Nakanishi Yohei,
Takeshita Tomohiro,
Qu Yang,
Imabayashi Hiroki,
Okamoto Shota,
Utsumi Hisayuki,
Kanehiro Masayuki,
Angioni Enrico,
Boardman Edward A.,
Hamilton Iain,
Zampetti Andrea,
BerrymanBousquet Valerie,
Smeeton Tim M.,
Ishida Takeshi
Publication year - 2020
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.910
Subject(s) - subpixel rendering , materials science , quantum dot , optoelectronics , photolithography , rgb color model , active matrix , lithography , light emitting diode , diode , nanoimprint lithography , shadow mask , optics , nanotechnology , thin film transistor , computer science , pixel , layer (electronics) , physics , fabrication , operating system , medicine , alternative medicine , pathology
We have developed full colour top emitting quantum dot light‐emitting diode (QD‐LED) display driven by a 176‐ppi active matrix of metal oxide thin‐film transistors. Red, green and blue (RGB) QD‐LED subpixel emission layers are patterned by our original UV photolithography process and materials. We also demonstrate the potential to achieve high resolution such as 528 ppi using this process.