Premium
Review of various measurement methodologies of migration ion influence on LCD image quality and new measurement proposal beyond LCD materials
Author(s) -
Inoue Masaru
Publication year - 2020
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.842
Subject(s) - liquid crystal display , materials science , optoelectronics , thin film transistor , liquid crystal , impurity , substrate (aquarium) , indium tin oxide , reliability (semiconductor) , diode , oled , layer (electronics) , nanotechnology , chemistry , power (physics) , oceanography , physics , organic chemistry , quantum mechanics , geology
Nowadays, thin‐film transistor liquid crystal displays (TFT‐LCDs) have realized high reliability of display characteristics by improving liquid crystal (LC) materials and cell fabrication processes. In order to improve display reliability, measurement methodologies are important to see the progress of improvement of materials and processes; thus, our group has proposed voltage holding ratio (VHR), ion impurity, residual direct current (DC) and elastic constants for LC cells, and the optical anisotropy of an alignment layer on indium tin oxide (ITO) glass substrate for LCD industry. In case of an ion impurity, we have succeeded in measuring the ion impurity amount in TFT‐LCD. Furthermore, we have recently proposed ion impurity measurement methodology for beyond LCD applications that are organic light emitting diode (OLED) and organic photovoltaics (OPV). In this review, I introduce each measurement methodology for LCDs and beyond LCDs in detail.