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Development of G6 exposure tool for 1.2 μm resolution
Author(s) -
Nagano Kouhei,
Yabu Nobuhiko,
Hakko Manabu,
Ando Miwako,
Izumi Nozomu,
Osaki Yoshinori
Publication year - 2019
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.774
Subject(s) - lithography , optics , multiple exposure , resolution (logic) , materials science , productivity , high resolution , computer science , optoelectronics , nanotechnology , environmental science , physics , artificial intelligence , remote sensing , geology , economics , macroeconomics
We have proposed exposure method using Deep UV (DUV) exposure light to realize high resolution and high productivity in FPD lithography. Here, we show development concepts for our new G6 exposure tools with DUV light sources and exposure test results with a test exposure tool.