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High resolution photolithography for direct view active matrix organic light‐emitting diode augmented reality displays
Author(s) -
Malinowski Paweł E.,
Ke TungHuei,
Nakamura Atsushi,
Liu YaHan,
Vander Velpen Dieter,
Vandenplas Erwin,
Papadopoulos Nikolas,
Kronemeijer Auke Jisk,
Steen JanLaurens,
Steudel Soeren,
Kuo CheCheng,
Huang YenYu,
Chen YuHsien,
Yeh MingHua,
Gelinck Gerwin,
Heremans Paul
Publication year - 2018
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.643
Subject(s) - photolithography , optoelectronics , materials science , pixel , rgb color model , oled , active matrix , diode , viewing angle , computational lithography , enabling , light emitting diode , optics , computer science , liquid crystal display , nanotechnology , physics , artificial intelligence , layer (electronics) , resist , thin film transistor , multiple patterning , psychology , psychotherapist
High‐resolution RGB organic light‐emitting diode frontplane is a key enabler for direct‐view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi‐transparent active displays. Organic light‐emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).