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Direct imaging exposure equipment with high overlay accuracy for flexible substrate in roll‐to‐roll method
Author(s) -
Kito Yoshiaki,
Hori Masakazu,
Hayashida Yosuke,
Suzuki Tomonari,
Komiyama Hiroki,
Watanabe Tomoyuki,
Kurashige Takahiro,
Kato Masaki,
Nara Kei
Publication year - 2017
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.566
Subject(s) - overlay , substrate (aquarium) , materials science , fabrication , polymer substrate , computer science , polymer , roll to roll processing , optoelectronics , thin film transistor , transistor , thin film , flexible display , nanotechnology , composite material , electrical engineering , medicine , oceanography , alternative medicine , engineering , pathology , layer (electronics) , voltage , programming language , geology
In order to fabricate thin‐film transistors on a flexible substrate, it is required to overlay patterns with high alignment accuracy. A polymer film can be deformed greatly and easily through thin‐film transistor fabrication processes because the glass transition point of a polymer film is below the maximum temperature of the processes. Furthermore, low stiffness of a polymer film can cause deformation when the polymer film is loaded on a working holder. These matters make it difficult to make patterns directly on a polymer film with high alignment accuracy. We proposed three concepts that solve three technical issues in order to directly make patterns with high overlay accuracy on a flexible film without a support substrate. We developed roll‐to‐roll exposure equipment with high overlay accuracy for a flexible substrate. Using this equipment, we succeeded to directly make patterns on a PET film, achieving a resolution of less than 6‐μm line and space pattern and an overlay accuracy of less than ±5 μm.