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Heat‐ and water‐proof quantum dot/siloxane composite film: Effect of quantum dot–siloxane linkage
Author(s) -
Kim Hwea Yoon,
Yoon DaEun,
Jang Junho,
Choi GwangMun,
Lee Doh C.,
Bae ByeongSoo
Publication year - 2017
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.542
Subject(s) - siloxane , materials science , passivation , quantum dot , chemical engineering , composite material , nanotechnology , polymer , layer (electronics) , engineering
We report on the effect of linkage between quantum dot (QD) and siloxane matrix by preparing two different QD/siloxane films. One has chemical linkages between QD and siloxane matrix, and the other has no chemical linkages between QD and siloxane matrix. The QD/siloxane (methacryl) film, which has the chemical linkages, exhibits no degradation of photoluminescence (PL) quantum yield (QY) under heat or moisture condition for over 1 month, while the QD/siloxane (epoxy) film, which has no linkages, shows drastic decreased of PL QY. The chemical linkages between QD and siloxane matrix that makes effective siloxane passivation layer intact on the surface of QDs in QD/siloxane (methacryl) film. Given its exceptional stability with the help of linkages between QD and siloxane matrix, we expect that the QD/siloxane (methacryl) film is best fitted in PL‐type down‐conversion layer for display applications.