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Character‐contrast measurements on emissive displays using replica masks under uniform ambient illumination
Author(s) -
Kelley Edward F.,
Eghtesadi Caesar,
Blubaugh Morgan,
Reuschel William
Publication year - 2012
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1002/jsid.124
Subject(s) - darkroom , replica , contrast (vision) , specular reflection , optics , character (mathematics) , high contrast , measure (data warehouse) , detector , computer science , materials science , physics , art , geometry , mathematics , visual arts , database
Abstract A replica‐mask method is presented to measure the contrast of character strokes on emissive displays under carefully controlled illumination. The method accounts for veiling glare introduced into the detector by the bright areas surrounding the dark characters. A sampling sphere is used to provide a uniform diffuse surround. Measurements of the diffuse reflectances are provided with specular included and with specular excluded. For emissive displays, the contrast depends both upon the darkroom characteristics of the emissive display and its reflective characteristics. Details are provided to replicate the measurement procedure.