z-logo
Premium
Micromechanical analysis of silicon nitride: a comparative study by fracture mechanics and Raman microprobe spectroscopy
Author(s) -
Tochino Shigemi,
Pezzotti Giuseppe
Publication year - 2002
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.901
Subject(s) - microprobe , raman spectroscopy , silicon nitride , micromechanics , materials science , fracture (geology) , composite material , ceramic , displacement (psychology) , fracture mechanics , silicon , analytical chemistry (journal) , forensic engineering , mineralogy , metallurgy , chemistry , optics , physics , engineering , psychology , chromatography , composite number , psychotherapist
Raman microprobe spectroscopy was used to characterize in situ microstress fields which develop during fracture of a toughened silicon nitride (Si 3 N 4 ) polycrystal. Maps of microscopic stress were collected in the neighborhood of a propagating crack both at zero and at critical loading conditions. Micromechanics results by Raman spectroscopy were analyzed and compared with conventional fracture mechanics assessments, such as the evaluation of rising R ‐curve behavior and crack opening displacement. Outcomes of these assessments illustrate that, despite the approximations involved in the piezo‐spectroscopic equations used for calculating the microstress field from a local Raman shift, Raman microprobe spectroscopy is a viable method for semi‐quantitative investigations of microfracture mechanisms in advanced ceramic materials. Copyright © 2002 John Wiley & Sons, Ltd.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom