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Micro‐Raman study of iridium silicides
Author(s) -
Almendra A.,
Rodríguez A.,
Rodríguez T.,
Martín P.,
Jiménez J.
Publication year - 2002
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.824
Subject(s) - raman spectroscopy , iridium , annealing (glass) , analytical chemistry (journal) , materials science , rutherford backscattering spectrometry , phonon , mineralogy , chemistry , thin film , nanotechnology , physics , optics , metallurgy , condensed matter physics , biochemistry , chromatography , catalysis
The micro‐Raman spectra of three iridium silicides, IrSi, IrSi 1.75 and IrSi 3 , were obtained. The silicides were prepared by rapid thermal annealing of iridium films deposited on Si substrates. The three phases were identified by Rutherford backscattering spectrometry. The main bands observed in the micro‐Raman spectra are described in order to provide a simple characterization method for these silicides with high spatial resolution. The three silicides present phonon bands around 165 and 200 cm −1 . Some additional broad bands between 240 and 500 cm −1 were also observed. Copyright © 2002 John Wiley & Sons, Ltd.