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The influence of chemical solvents on the properties of CVD graphene
Author(s) -
Wu Zhang Ting,
Zhao Wei Wei,
Chen Wei Yu,
Jiang Jie,
Nan Hai Yan,
Guo Xi Tao,
Liang Zheng,
Chen Yu Ming,
Chen Yun Fei,
Ni Zhen Hua
Publication year - 2015
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.4582
Subject(s) - graphene , ferric , raman spectroscopy , ammonium persulfate , chemical vapor deposition , inorganic chemistry , chemistry , chloride , persulfate , materials science , chemical engineering , nanotechnology , organic chemistry , polymer , polymerization , catalysis , physics , engineering , optics
The ultra‐clean and defect‐free transfer of chemical vapor deposition (CVD) graphene is essential for its application in electronic devices. Here, we study the influence of commonly used etching solvents during the transfer process, i.e. ammonium persulfate, ferric chloride, and ferric nitrate, on the properties of CVD graphene by Raman spectroscopy. Obvious blue shift and broadening of Raman G and 2D peaks were observed for graphene transferred by ferric chloride and ferric nitrate, as compared to that transferred by ammonium persulfate. These changes are attributed to p ‐doping as well as reduction of phonon lifetime of graphene in the presence of residue iron compounds during the transfer process. The latter would also introduce a great reduction of thermal conductivity of graphene, e.g. with 76% reduction for graphene transferred by ferric nitrate as compared to that transferred by ammonium persulfate. This work would provide valuable information for the transfer of high‐quality CVD graphene. Copyright © 2014 John Wiley & Sons, Ltd.

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