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Ion beam engineered nano silver silicon substrates for surface enhanced Raman spectroscopy
Author(s) -
Wijesundera Dharsha.,
Rajapaksa Indrajith,
Wang Xeumei,
Liu JiaRui,
Rusakova Irene,
Chu WeiKan
Publication year - 2013
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.4326
Subject(s) - raman spectroscopy , silicon , nano , surface enhanced raman spectroscopy , materials science , ion beam , solubility , spectroscopy , ion , focused ion beam , nanotechnology , analytical chemistry (journal) , detection limit , chemical engineering , chemistry , optoelectronics , raman scattering , composite material , optics , chromatography , organic chemistry , physics , quantum mechanics , engineering
We demonstrate a method for engineering substrates for surface enhanced Raman spectroscopy (SERS) by Ag − ion implantation in Si. The implantation dose and beam current density are chosen such that the Ag concentration in Si exceeds the solid solubility limit, causes aggregation of Ag and nucleates Ag nano particles. The embedded nano particles are then partially exposed by a wet etch process. Our measurements show that the so fabricated nano‐composite substrates are very effective as stable and reproducible SERS substrates. Copyright © 2013 John Wiley & Sons, Ltd.